
LFC‑7650
Malema Low-flow ultrasonic controller
Low-flow ultrasonic controller
The Malema LFC-7650 Series is a high-precision ultrasonic liquid flow controller designed for accurate closed-loop control of high-purity liquids, aggressive chemicals, CMP slurries, and ultrapure DI water in semiconductor and advanced process applications. The controller combines non-invasive ultrasonic flow measurement with an integrated precision control valve, allowing highly stable and repeatable flow control without moving parts inside the flow sensor. This minimizes contamination risk, pressure drop, particle generation, and maintenance requirements in critical high-purity systems.
The LFC-7650 Series features an all-PFA/PTFE wetted flow path with excellent chemical compatibility for aggressive semiconductor process chemicals and abrasive slurry applications. Advanced digital signal processing technology provides accurate flow control even under challenging conditions such as entrained bubbles or varying fluid properties. Depending on the application, the system may utilize a diaphragm valve or motor-driven pinch valve for optimized chemical or slurry handling performance.
Typical performance includes high control accuracy, fast response time, excellent repeatability, and support for analog and digital communication interfaces for semiconductor automation integration. Available configurations support multiple flow ranges and high-purity flare or pillar process connections for flexible installation into wet process equipment.
Typical applications include CMP slurry delivery, semiconductor wet clean systems, copper plating systems, chemical blending systems, ultrapure chemical dispense systems, post-CMP cleaning tools, and advanced process systems requiring contamination-free ultra-accurate liquid flow control.
The LFC-7650 Series features an all-PFA/PTFE wetted flow path with excellent chemical compatibility for aggressive semiconductor process chemicals and abrasive slurry applications. Advanced digital signal processing technology provides accurate flow control even under challenging conditions such as entrained bubbles or varying fluid properties. Depending on the application, the system may utilize a diaphragm valve or motor-driven pinch valve for optimized chemical or slurry handling performance.
Typical performance includes high control accuracy, fast response time, excellent repeatability, and support for analog and digital communication interfaces for semiconductor automation integration. Available configurations support multiple flow ranges and high-purity flare or pillar process connections for flexible installation into wet process equipment.
Typical applications include CMP slurry delivery, semiconductor wet clean systems, copper plating systems, chemical blending systems, ultrapure chemical dispense systems, post-CMP cleaning tools, and advanced process systems requiring contamination-free ultra-accurate liquid flow control.
• High-accuracy flow controller with ±1% of setpoint control over the full flow range
• Wide flow control capability from 50 mL/min to 4,000 mL/min with fast response (<2–3 s typical) and 20:1 turndown
• Drop-in replacement for differential pressure flow meters, including built-in pressure sensor analog output
• PTFE/PFA wetted construction for UHP chemicals and DI water; drift-free performance under changing environmental or temperature conditions
• Low-maintenance ultrasonic design with no moving parts; repairable components to extend service life
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